Ogawa Shinichi | Semiconductor Leading Edge Technologies Inc.
スポンサーリンク
概要
関連著者
-
Ogawa Shinichi
Semiconductor Leading Edge Technologies Inc.
-
Shimada Miyoko
Semiconductor Leading Edge Technologies Inc.
-
Otsuka Yuji
Toray Research Center Inc.
-
SHIMADA Miyoko
Semiconductor Leading Edge Technologies Inc. (Selete)
-
Soda Eiichi
Semiconductor Leading Edge Technologies Inc.
-
Ogawa Shinichi
Semiconductor Leading Edge Technologies Inc. (selete)
-
FURUYA Akira
Semiconductor Leading Edge Technologies Inc. (Selete)
-
Tarumi Nobuaki
Semiconductor Leading Edge Technologies Inc.
-
Kawasaki Naohiko
Toray Research Center Inc.
-
Ogawa Shinichi
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.
著作論文
- Plasma Cure Process for Porous SiOCH Films using CF_4 Gas
- Plasma-Enhanced ALD Ru Thin Films on PVD-TaN Films with Smooth Morphology at Low Temperature Using DER Ru Precursor
- Etch-byproduct Pore Sealing for ALD-TaN Deposition on Porous Low-k Film
- Characterization of Low-k Interconnect Dielectrics by EELS
- Nano-meter order Structures of Porous Low-k Films and their Impacts on Cu/Low-k Processes
- A Low Parasitic Capacitance Scheme by Thermally Stable Titanium Silicide Technology for High Speed Complementary-Metal-Oxide-Semiconductor
- Novel Air-gap Formation Technology Using Ru Barrier Metal for Cu Interconnects with High Reliability and Low Capacitance
- Process-Induced Damage Characterization of Patterned Low-$\kappa$ Film Using Electron Energy Loss Spectroscopy Technique
- Etch-Byproduct Pore Sealing for Atomic-Layer-Deposited-TaN Deposition on Porous Low-$k$ Film