Ogawa Shinichi | Semiconductor Leading Edge Technologies Inc.
スポンサーリンク
概要
関連著者
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Ogawa Shinichi
Semiconductor Leading Edge Technologies Inc.
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Shimada Miyoko
Semiconductor Leading Edge Technologies Inc.
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Otsuka Yuji
Toray Research Center Inc.
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SHIMADA Miyoko
Semiconductor Leading Edge Technologies Inc. (Selete)
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Soda Eiichi
Semiconductor Leading Edge Technologies Inc.
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Ogawa Shinichi
Semiconductor Leading Edge Technologies Inc. (selete)
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FURUYA Akira
Semiconductor Leading Edge Technologies Inc. (Selete)
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Tarumi Nobuaki
Semiconductor Leading Edge Technologies Inc.
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Kawasaki Naohiko
Toray Research Center Inc.
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Ogawa Shinichi
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.
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Yoshida Tomoaki
Department Of Materials Science Faculty Of Engineering Tohoku University
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INOUE Yasuhide
NISSAN ARC, LTD.
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Okamura Hiroshi
Semiconductor Leading Edge Technologies Inc. (selete)
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Inoue Yasuhide
Nissan Arc Ltd.
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OHASHI Naofumi
Semiconductor Leading Edge Technologies, Inc.
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SODA Eiichi
Semiconductor Leading Edge Technologies Inc. (Selete)
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OHTSUKA Nobuyuki
Semiconductor Leading Edge Technologies Inc. (Selete)
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Ohashi Naofumi
Semiconductor Leading Edge Technologies Inc. (selete)
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Nakahira Junya
Semiconductor Leading Edge Technologies Inc. (selete)
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KAWASAKI Naohiko
Toray Research Center, Inc.
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SHIMANUKI Junichi
NISSAN ARC, Ltd.
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HARADA Takahiro
Toray Research Center, Inc.
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Yoshida Takehito
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.:(present Address)matsushita Re
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TOMIOKA Kazuhiro
Semiconductor Leading Edge Technologies, Inc. (Selete)
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KONDO Seiichi
Semiconductor Leading Edge Technologies, Inc. (Selete)
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SAITO Shuichi
Semiconductor Leading Edge Technologies, Inc. (Selete)
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NAMBA Kunitoshi
Semiconductor Leading Edge Technologies, Inc.
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HOSOI Nobuki
Semiconductor Leading Edge Technologies, Inc.
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TARUMI Nobuaki
Semiconductor Leading Edge Technologies, Inc.
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SHINRIKI Hiroshi
ASM Japan K.K.
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MIYAJIMA Akio
Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.
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YANO Kousaku
Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.
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Miyajima Akio
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.
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Yano Kousaku
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.
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Ohashi Naofumi
Semiconductor Leading Edge Technologies Inc.
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Hosoi Nobuki
Semiconductor Leading Edge Technologies Inc.
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Tomioka Kazuhiro
Semiconductor Leading Edge Technologies Inc. (selete)
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Shimanuki Junichi
Nissan Arc Ltd.
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Harada Takahiro
Toray Research Center Inc.
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Namba Kunitoshi
Semiconductor Leading Edge Technologies Inc.
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Kondo Seiichi
Semiconductor Leading Edge Technologies Inc. (selete)
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Saito Shuichi
Semiconductor Leading Edge Technologies Inc. (selete)
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Tanaka Isao
Department Of Internal Medicine Suzuka Kaisei Hospital
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Shiohara Morio
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Takigawa Yukio
Semiconductor Leading Edge Technologies, Inc., Tsukuba, Ibaraki 305-8569, Japan
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Oda Noriaki
Semiconductor Leading Edge Technologies, Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Ogawa Shinichi
Semiconductor Leading Edge Technologies, Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Ogawa Shinichi
Semiconductor Leading Edge Technologies Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Shimizu Yumiko
Toray Research Center, Inc., 3-3-7 Sonoyama, Otsu 520-8567, Japan
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Takigawa Yukio
Semiconductor Leading Edge Technologies, Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Otsuka Yuji
Toray Research Center, Inc., 3-3-7 Sonoyama, Otsu 520-8567, Japan
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Shimada Miyoko
Semiconductor Leading Edge Technologies Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Furuya Akira
Semiconductor Leading Edge Technologies Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Soda Eiichi
Semiconductor Leading Edge Technologies Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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OGAWA Shinichi
Semiconductor Leading Edge Technologies, Inc. (Selete)
著作論文
- Plasma Cure Process for Porous SiOCH Films using CF_4 Gas
- Plasma-Enhanced ALD Ru Thin Films on PVD-TaN Films with Smooth Morphology at Low Temperature Using DER Ru Precursor
- Etch-byproduct Pore Sealing for ALD-TaN Deposition on Porous Low-k Film
- Characterization of Low-k Interconnect Dielectrics by EELS
- Nano-meter order Structures of Porous Low-k Films and their Impacts on Cu/Low-k Processes
- A Low Parasitic Capacitance Scheme by Thermally Stable Titanium Silicide Technology for High Speed Complementary-Metal-Oxide-Semiconductor
- Novel Air-gap Formation Technology Using Ru Barrier Metal for Cu Interconnects with High Reliability and Low Capacitance
- Process-Induced Damage Characterization of Patterned Low-$\kappa$ Film Using Electron Energy Loss Spectroscopy Technique
- Etch-Byproduct Pore Sealing for Atomic-Layer-Deposited-TaN Deposition on Porous Low-$k$ Film