Shimada Miyoko | Semiconductor Leading Edge Technologies Inc.
スポンサーリンク
概要
関連著者
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Ogawa Shinichi
Semiconductor Leading Edge Technologies Inc.
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Shimada Miyoko
Semiconductor Leading Edge Technologies Inc.
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SHIMADA Miyoko
Semiconductor Leading Edge Technologies Inc. (Selete)
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Otsuka Yuji
Toray Research Center Inc.
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FURUYA Akira
Semiconductor Leading Edge Technologies Inc. (Selete)
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Soda Eiichi
Semiconductor Leading Edge Technologies Inc.
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Ogawa Shinichi
Semiconductor Leading Edge Technologies Inc. (selete)
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INOUE Yasuhide
NISSAN ARC, LTD.
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Okamura Hiroshi
Semiconductor Leading Edge Technologies Inc. (selete)
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Inoue Yasuhide
Nissan Arc Ltd.
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OHASHI Naofumi
Semiconductor Leading Edge Technologies, Inc.
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SODA Eiichi
Semiconductor Leading Edge Technologies Inc. (Selete)
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OHTSUKA Nobuyuki
Semiconductor Leading Edge Technologies Inc. (Selete)
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Ohashi Naofumi
Semiconductor Leading Edge Technologies Inc. (selete)
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KAWASAKI Naohiko
Toray Research Center, Inc.
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SHIMANUKI Junichi
NISSAN ARC, Ltd.
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HARADA Takahiro
Toray Research Center, Inc.
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Ohashi Naofumi
Semiconductor Leading Edge Technologies Inc.
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Kawasaki Naohiko
Toray Research Center Inc.
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Shimanuki Junichi
Nissan Arc Ltd.
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Harada Takahiro
Toray Research Center Inc.
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Ogawa Shinichi
Semiconductor Leading Edge Technologies Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Shimada Miyoko
Semiconductor Leading Edge Technologies Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Furuya Akira
Semiconductor Leading Edge Technologies Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Soda Eiichi
Semiconductor Leading Edge Technologies Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
著作論文
- Etch-byproduct Pore Sealing for ALD-TaN Deposition on Porous Low-k Film
- Characterization of Low-k Interconnect Dielectrics by EELS
- Nano-meter order Structures of Porous Low-k Films and their Impacts on Cu/Low-k Processes
- Etch-Byproduct Pore Sealing for Atomic-Layer-Deposited-TaN Deposition on Porous Low-$k$ Film