Plasma-Enhanced ALD Ru Thin Films on PVD-TaN Films with Smooth Morphology at Low Temperature Using DER Ru Precursor
スポンサーリンク
概要
- 論文の詳細を見る
- 2007-09-19
著者
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Ogawa Shinichi
Semiconductor Leading Edge Technologies Inc.
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NAMBA Kunitoshi
Semiconductor Leading Edge Technologies, Inc.
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HOSOI Nobuki
Semiconductor Leading Edge Technologies, Inc.
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TARUMI Nobuaki
Semiconductor Leading Edge Technologies, Inc.
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SHINRIKI Hiroshi
ASM Japan K.K.
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Hosoi Nobuki
Semiconductor Leading Edge Technologies Inc.
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Tarumi Nobuaki
Semiconductor Leading Edge Technologies Inc.
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Namba Kunitoshi
Semiconductor Leading Edge Technologies Inc.
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- Plasma-Enhanced ALD Ru Thin Films on PVD-TaN Films with Smooth Morphology at Low Temperature Using DER Ru Precursor
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