23-P-19 Influence of Process Gas on the Properties of Amorphous Carbon Thin Films Deposited by Magnetron Sputtering
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概要
- 論文の詳細を見る
- 日本セラミックス協会の論文
- 2003-09-29
著者
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Suzuki Masahiro
National Cancer Center
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Koga Y
National Institute Of Advanced Industrial Science And Technology (aist)
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KOGA Yoshinori
National Institute of Advanced Industrial Science and Technology (AIST)
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TANAKA Akihiro
National Institute of Advanced Industrial Science and Technology
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ISHIHARA Masatou
National Institute of Advanced Industrial Science and Technology Research Center for Advanced Carbon
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TSUGAWA Kazuo
National Institute of Advanced Industrial Science and Technology, Research Center for Advanced Carbo
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TSUDA Osamu
National Institute of Advanced Industrial Science and Technology, Research Center for Advanced Carbo
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KOKAI Fumio
Mie University, Department of Chemistry for Materials
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