23-I-04 Large Area Nanocrysstalline Diamond Coatings on Glass
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概要
- 論文の詳細を見る
- 日本セラミックス協会の論文
- 2003-09-29
著者
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Koga Y
National Institute Of Advanced Industrial Science And Technology (aist)
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Koga Yoshinori
Research Center For Advanced Carbon Materials Aist
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TSUGAWA Kazuo
Research Center for Advanced Carbon Materials, AIST
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SHELBY Mark
Applied Films GmbH & Co KG
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LIEHR Michel
Applied Films GmbH & Co KG
関連論文
- Photochemical Modification of Diamond Films with Sulfur-Containing Functionalities
- 23-P-23 Tribological Properties of DLC Films on Steel Disks Deposited by Pulsed Bias CVD Method
- 23-P-20 Formation of (110) Oriented LiNbO_3 Thin Films on Polycrystalline Diamond Substrates at Low Substrate Temperature
- 23-P-19 Influence of Process Gas on the Properties of Amorphous Carbon Thin Films Deposited by Magnetron Sputtering
- 23-P-18 Chemical Modification of Diamond Powder Using Photolysis of Perfluoroazooctane
- Synthesis and Surface Acoustic Wave Property of Aluminum Nitride Thin Films Fabricated on Silicon and Diamond Substrates Using the Sputtering Method : Surfaces, Interfaces, and Films
- Binding Energies of Amorphous CN and SiCN Films on X-Ray Photoelectron Spectroscopy : Surfaces, Interfaces, and Films
- Study on Surface Acoustic Wave Characteristics of SiO_2/Interdigital-Transducer/ZnO/Diamond Structure and Fabrication of 2.5 GHz Narrow Band Filter
- The Fraction of Sp^3 Bonding in Carbon Thin Film Prepared Using Pulsed Laser Deposition
- Formation of Cubic Phase Carbon Nitride Solid by Low Energy Nitrogen Implantation into Graphite
- Sidewall Modification of Single-walled Carbon Nanotubes with Sulfur-containing Functionalities and Gold Nanoparticle Attachment
- 23-O-06 Crystalline Carbon Nitride Film on Sapphire by Microwave Plasma CVD
- 23-I-04 Large Area Nanocrysstalline Diamond Coatings on Glass
- Effect of Laser Wavelength for Surface Morphology of Aluminum Nitride Thin Films by Nitrogen Radical-Assisted Pulsed Laser Deposition
- Influence of DC Biasing on the Formation of Hydrogenated Amorphous Carbon Films Using a Plasma-Based Ion Implantation Technique
- Development of Plasma Based Ion Implantation System using an Electron Cyclotron Resonance Plasma Source with a Mirror Field and Synthesis of Carbon Thin Films
- Development of Plasma Based Ion Implantation System using an Electron Cyclotron Resonance Plasma Source with a Mirror Field and Synthesis of Carbon Thin Films