Development of Photolithography Process for Printed Circuit Board Using Liquid Crystal Mask in Place of Photomask
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概要
- 論文の詳細を見る
In this paper, we present a photolithography method for printed circuit boards using a liquid crystal mask (LCM) in place of a photomask. The LCM photolithography method has the advantage of ease of forming various patterns. There were opaque interpixel regions of the LCMs; the areas on the dry film resist (DFR) located under the interpixel regions of the LCM were not exposed to illumination. The unexposed DFR area could be exposed to illumination by utilizing the Fresnel diffraction effects that were due to a gap maintained between the LCM and the DFR during the exposure process. DFR patterns with a width of 200 μm were obtained successfully using the 160 μm gap between LCM and DFR and three sheets of DFR for the exposure process.
- 2012-09-25
著者
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Oh Min
Department Of Metallurgical Engineering School Of Materials Science And Engineering Yonsei Universit
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Lee Jae
Division Of Cardiology Asan Medical Center University Of Ulsan College Of Medicine
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Kim Chang
Department Of Biochemistry University Of Oxford
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Lee Ho-Nyeon
Department of Display and Electronic Information Engineering, Soonchunhyang University, Asan, Chungnam 336-745, Korea
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Hong Chinsoo
Department of Electronic Physics, Soonchunhyang University, Asan, Chungnam 336-745, Korea
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Kim Chang
Department of Display and Electronic Information Engineering, Soonchunhyang University, Asan, Chungnam 336-745, Korea
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Oh Min
Department of Display and Electronic Information Engineering, Soonchunhyang University, Asan, Chungnam 336-745, Korea
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