Effects of BF_2 and B Implantation-Doping on Crystalline Degradation of Pseudomorphic Metastable Ge_<0.06>Si_<0.94>
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-12-30
著者
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Oh Min
Department Of Metallurgical Engineering School Of Materials Science And Engineering Yonsei Universit
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Song Jong
Advanced Analysis Center Korea Institute Of Science And Technology
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IM Seongil
Department of Metallurgical Engineering, School of Materials Science and Engineering, Yonsei Univers
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KIM Hyo
Atomic-scale Surface Science Research Center and Department of Physics, Yonsei University
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Kim Hyo
Atomic-scale Surface Science Research Center & Department Of Physics Yonsei University
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Joo Min
Department Of Metallurgical Engineering School Of Materials Science And Engineering Yonsei Universit
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Im Seongil
Department Of Metallurgical Engineering School Of Materials Science And Engineering Yonsei Universit
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Kim H
Hanyang Univ. Seoul Kor
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KIM Hyun
Surface Analysis Group, Korea Research Institute of Standards and Science
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Kim H
Department Of Electronics And Computer Engineering Korea University
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Oh Min
Department of Display and Electronic Information Engineering, Soonchunhyang University, Asan, Chungnam 336-745, Korea
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Oh Min
Department of Biomedical Engineering, Inje University
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- Effects of BF_2 and B Implantation-Doping on Crystalline Degradation of Pseudomorphic Metastable Ge_Si_
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