A Miniature Micro-Machined Millimeter-Wave Bandpass Filter By Complementary Metal–Oxide–Semiconductor Compatible Inductively-Coupled-Plasma Deep-Trench Technology
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概要
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In this paper, we demonstrate that miniature millimeter-wave band-pass filter can be obtained by replacing the traditional coplanar waveguide structures with the miniature lumped-spiral inductors and metal–insulator–metal (MIM) capacitors. To study the silicon substrate effects on the performances of the miniature spiral inductor and band-pass filter, complementary metal–oxide–semiconductor (CMOS)-process-compatible backside inductively-coupled-plasma (ICP) deep-trench technology was used to selectively remove the silicon underneath them. The results show that a 70.9% (from 5.8 to 9.91) and a 298.7% (from 2.33 to 9.29) increase in Q-factor were achieved at 40 and 60 GHz, respectively, for a 251.7 pH miniature spiral inductor after the backside ICP dry etching. In addition, a 0.9 dB (from $-5.4$ to $-4.6$ dB) improvement in peak insertion loss ($S_{21}$) was achieved for a miniature band-pass filter with 3-dB bandwidth of 47.7 GHz (18.4–66.1 GHz) after the backside ICP dry etching. The chip area of the miniature band-pass filter was only $206\times 106$ μm2 excluding the test pads.
- 2008-01-25
著者
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Wang Tao
Graduate Institute Of Electronics Engineering And Department Of Electrical Engineering National Taiw
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LU Shey-Shi
Graduate Institute of Electronics Engineering and Department of Electrical Engineering, National Tai
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Chen Chi-chen
Department Of Electrical Engineering National Chi Nan University
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Lin Yo-sheng
Department Of Electrical Engineering National Chi-nan University
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Lu Shey-Shi
Graduate Institute of Electronics Engineering and Department of Electrical Engineering, National Taiwan University, Taipei, Taiwan
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Chang Jin-Fa
Department of Electrical Engineering, National Chi Nan University, Puli, Taiwan
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Chen Chang-Zhi
Department of Electrical Engineering, National Chi Nan University, Puli, Taiwan
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Lin Yo-Sheng
Department of Electrical Engineering, National Chi Nan University, Puli, Taiwan
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Chen Chi-Chen
Department of Electrical Engineering, National Chi Nan University, Puli, Taiwan
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Wang Tao
Graduate Institute of Electronics Engineering and Department of Electrical Engineering, National Taiwan University, Taipei, Taiwan
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