Radio-Frequency-Driven Atmospheric-Pressure Plasmas in Contact with Liquid Water
スポンサーリンク
概要
- 論文の詳細を見る
Atmospheric-pressure plasmas were produced on the surface of liquid water by radio-frequency (RF) power supply. A quartz chamber with an off-center inner electrode was used to generate discharges with a wide range of filling gas pressures. When the chamber was filled with fuel gas and liquid water and a sufficient RF power was supplied to the system, plasmas were observed to be produced around the inner electrode as well as on the water surface. Optical emission spectroscopy (OES) identified the generation of oxidative hydroxyl (OH) radicals and decoloration of methylene blue in the solution demonstrated oxidative capacity of water plasmas generated in this system.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2006-10-30
著者
-
Hamaguchi Satoshi
Center For Atomic And Molecular Technologies Graduate School Of Engineering Osaka University
-
Kitano Katsuhisa
Center For Atomic And Molecular Technologies Osaka Univ.
-
Kitano Katsuhisa
Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan
-
Aoki Hironori
Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan
関連論文
- Temporal Evolution of Ion Fragment Production from Dimethylsilane by a Hot Tungsten Wire and Compounds Deposited on the Tungsten Surface
- Fragment Ions of Dimethylsilane Produced by Hot Tungsten Wires
- Si Recess of Polycrystalline Silicon Gate Etching: Damage Enhanced by Ion Assisted Oxygen Diffusion
- Fragment Ions of Dimethylsilane Produced by Hot Tungsten Wires
- 3C1558 大気圧低温プラズマを用いたアミロイド線維の破壊(3C 分子遺伝・遺伝情報制御、発生・分化、放射線生物/活性酵素,日本生物物理学会第49回年会)
- Temporal Evolution of Ion Fragment Production from Dimethylsilane by a Hot Tungsten Wire and Compounds Deposited on the Tungsten Surface
- Fragment Ions of Methylsilane Produced by Hot Tungsten Wires
- Sputtering Yields of CaO, SrO, and BaO by Monochromatic Noble Gas Ion Bombardment
- Extracellular Matrix Patterning for Cell Alignment by Atmospheric Pressure Plasma Jets
- Radio-Frequency-Driven Atmospheric-Pressure Plasmas in Contact with Liquid Water
- Reducing Damage to Si Substrates during Gate Etching Processes
- Molecular Dynamics Simulations of Organic Polymer Dry Etching at High Substrate Temperatures
- Measurement of Magnesium Oxide Sputtering Yields by He and Ar Ions with a Low-Energy Mass-Selected Ion Beam System
- Numerical Analysis of Incident Angle Effects in Reactive Sputtering Deposition of Amorphous SiO2
- Arrangement of PC12 Cells on a Silicon Chip via Extracellular Matrix (ECM) Layer Patterning by Atmospheric Pressure Plasmas
- Effects of Neutral Particle Density on Equilibrium of Field-Reversed Configuration Sustained by Rotating Magnetic Field