Transport Properties of Pt Nanowires Fabricated by Beam-Induced Deposition
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概要
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Pt nanowires were fabricated using electron-beam (EB)- and focused-ion-beam (FIB)-induced deposition. The resistance of the EB-deposited nanowires was high (${\approx}10^{7}$ $\Omega$) as deposited and increased markedly when cooled down. The observed temperature dependence of the resistance of the EB-deposited wires indicates that the electron transport in the wires is dominated by variable range hopping (VRH). Coulomb oscillations were observed at temperatures up to ${\approx}200$ K for EB-deposited wires simultaneously with VRH. Postannealing was effective to reduce the resistance. The resistance of the FIB-deposited nanowires, in contrast, hardly depended on temperature. Positive magnetoresistance due to weak antilocalization was observed in the case of the FIB-deposited wires.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-07-15
著者
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TSUKATANI Yosuke
Research Center for Materials Science at Extreme Conditions and Graduate School of Engineering Scien
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YAMASAKI Naoki
Research Center for Materials Science at Extreme Conditions and Graduate School of Engineering Scien
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MURAKAMI Katsuhisa
Research Center for Materials Science at Extreme Conditions and Graduate School of Engineering Scien
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WAKAYA Fujio
Research Center for Materials Science at Extreme Conditions and Graduate School of Engineering Scien
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Takai Mikio
Research Center For Environmental Genomics Kobe University
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Wakaya Fujio
Research Center for Materials Science at Extreme Conditions and Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama, Toyonaka, Osaka 560-8531, Japan
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Tsukatani Yosuke
Research Center for Materials Science at Extreme Conditions and Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama, Toyonaka, Osaka 560-8531, Japan
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Murakami Katsuhisa
Research Center for Materials Science at Extreme Conditions and Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama, Toyonaka, Osaka 560-8531, Japan
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