Characterization of Slurry Residues in Pad Grooves for Diamond Disc and High Pressure Micro Jet Pad Conditioning Processes
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概要
- 論文の詳細を見る
Slurry residues inside pad grooves are quantified by UV-enhanced fluorescence (UVEF) technique for conventional diamond disc and high pressure micro jet (HPMJ) pad conditioning methods. Results show that with HPMJ pad conditioning, slurry residues inside pad grooves decrease with time at twice the rate compared to diamond disc conditioning. Therefore, this suggests that HPMJ pad conditioning is a viable method to extend pad life and possibly improve wafer-level defectivity.
- Japan Society of Applied Physicsの論文
- 2006-12-25
著者
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Zhuang Yun
Araca Inc.
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PHILIPOSSIAN Ara
Department of Chemical and Environmental Engineering University of Arizona
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Li Zhonglin
Department Of Chemical And Environmental Engineering University Of Arizona
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LEE Hyosang
Department of Chemical and Environmental Engineering, University of Arizona
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SEIKE Yoshiyuki
Asahi Sunac Corporation
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TAKAOKA Mineo
Asahi Sunac Corporation
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MIYACHI Keiji
Asahi Sunac Corporation
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Philipossian Ara
Department of Chemical and Environmental Engineering, University of Arizona, Tucson, Arizona 85721, U.S.A.
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Takaoka Mineo
Asahi Sunac Corporation, 5050 Asahimae-cho, Owariasahi, Aichi 488-8688, Japan
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Zhuang Yun
Araca, Inc., 6655 North Canyon Crest Drive, Suite 1205, Tucson, Arizona 85750, U.S.A.
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Miyachi Keiji
Asahi Sunac Corporation, 5050 Asahimae-cho, Owariasahi, Aichi 488-8688, Japan
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Seike Yoshiyuki
Asahi Sunac Corporation, 5050 Asahimae-cho, Owariasahi, Aichi 488-8688, Japan
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Lee Hyosang
Department of Chemical and Environmental Engineering, University of Arizona, Tucson, Arizona 85721, U.S.A.
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Li Zhonglin
Department of Chemical and Environmental Engineering, University of Arizona, Tucson, Arizona 85721, U.S.A.
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