Structural Properties of Amorphous Carbon Nitride Films Prepared by Reactive RF-Magnetron Sputtering
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概要
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Highly nitrogenated amorphous carbon films have been prepared by reactive rf-magnetron sputtering using pure N2 or Ar/N2 mixed gases. The nitrogen content measured by Rutherford backscattering spectrometry was 40 at% for pure N2 gas and 35 at% for Ar75%–N225% mixed gas. Oxygen atoms of about 7 at% were also detected. Infrared spectra showed a broad absorption band in the range from 1200 to 1600 cm-1 assigned to the N atoms incorporated in the bonding network of amorphous carbon. They showed an absorption band near 2200 cm-1 assigned to the C$\equiv$N or N$=$C$=$O bond, but no trace of the N–H or C–H bond was seen.
- 1993-10-20
著者
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NAGATA Shinji
Institute for Chemical Research, Kyoto University
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TSUCHIYA Yasuaki
Department of Chemistry, Faculty of Science, Kyoto University
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TAMADA Satoru
Department of Chemistry, Faculty of Science, Kyoto University
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KOSUGE Kouji
Department of Chemistry, Faculty of Science, Kyoto University
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Nakayama Noriaki
Department Of Advanced Materials Science And Engineering Faculty Of Engineering
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Takahiro Katsumi
Institute For Materials Research Tohoku University
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Yamaguchi Sadae
Institute For Materials Research Tohoku University
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Tsuchiya Yasuaki
Department of Chemistry, Faculty of Science, Kyoto University, Kyoto 606-01
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Nakayama Noriaki
Department of Chemistry, Faculty of Science, Kyoto University, Kyoto 606-01
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Kosuge Kouji
Department of Chemistry, Faculty of Science, Kyoto University, Kyoto 606-01
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Tamada Satoru
Department of Chemistry, Faculty of Science, Kyoto University, Kyoto 606-01
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Nagata Shinji
Institute for Materials Research, Tohoku University, Sendai 980
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