Gasochromic Properties of Nanostructured Tungsten Oxide Films Prepared by Sputtering Deposition
スポンサーリンク
概要
- 論文の詳細を見る
The effects of surface morphology on the gasochromic properties of tungsten trioxide (WO3) films are reported. WO3 films with various crystalline structures and surface morphologies are prepared by reactive rf magnetron sputtering by adjusting the substrate temperature and oxygen concentration in a sputtering gas during deposition. Grain structures on these films were confirmed by atomic force microscopy observation. The gasochromic properties of the WO3 films coated with a palladium catalyst were examined on the basis of a change in optical transmittance with 645-nm-wavelength light in 1% hydrogen in argon gas. WO3 films with a (001) orientation show sufficient gasochromic properties for their application to fiber-optic hydrogen gas sensors. The growth of the nanocrystalline structure in the WO3 films seems to improve gasochromic properties.
- 2007-09-30
著者
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NAGATA Shinji
Institute for Chemical Research, Kyoto University
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Yoshikawa Masahito
Quantum Beam Science Directorate Japan Atomic Energy Agency
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Sugimoto Masaki
Quantum Beam Science Directorate Japan Atomic Energy Agency
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Yamamoto Shunya
Quantum Beam Science Directorate, Japan Atomic Energy Agency, 1233 Watanuki, Takasaki, Gunma 370-1292, Japan
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Takano Katsuyoshi
Quantum Beam Science Directorate, Japan Atomic Energy Agency, Takasaki, Gunma 370-1292, Japan
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Inouye Aichi
Institute of Materials Research, Tohoku University, Sendai 980-8577, Japan
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Sugimoto Masaki
Quantum Beam Science Directorate, Japan Atomic Energy Agency, Takasaki, Gunma 370-1292, Japan
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Yoshikawa Masahito
Quantum Beam Science Directorate, Japan Atomic Energy Agency, Takasaki, Gunma 370-1292, Japan
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Nagata Shinji
Institute of Materials Research, Tohoku University, Sendai 980-8577, Japan
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