Nitriding of Evaporated-Ti Thin Films by Ion Implantation
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-06-15
著者
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Nagata Shoichi
Dep. Of Materials Sci. And Engineering Muroran Inst. Of Technol. 27-1 Mizumoto-cho Muroran Hokkaido
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Nagata Shoichi
Muroran Inst. Technol. Hokkaido Jpn
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YAMADA Yukio
Department of Mechanical Engineering and Intelligent Systems, University of Electro-Communications
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Yokoyama Y
Inst. For Materials Res. Tohoku Univ.
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Nagata S
Osaka Univ.
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NAGATA Shinji
Institute for Chemical Research, Kyoto University
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粕壁 善隆
東北大学国際交流センター
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Yoshida Y
Department Of Energy Engineering And Science Nagoya University
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Yamada Y
Akita Univ. Akita Jpn
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Yamada Yuh
National Research Institute For Metals
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YAMAGUCHI Sadae
Institute for Materials Research, Tohoku University
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Yamaguchi Sadaei
Institute For Materials Research Tohoku University
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KASUKABE Yoshitaka
Department of Materials Science and Enginnering, Waseda University
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Fujino Y
Department Of Quantum Science And Energy Engineering Tohoku University
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Fujino Yutaka
Department Of Nuclear Engineering Tohoku University
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Nagata S
Tohoku University
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Nasu Shoichi
Kanazawa Institute Of Technology
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KISHIMOTO Mokuyoshi
Institute for Mateials Research, Tohoku University
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OOTUBO Junichi
Department of Nuclear Engineering, Faculty of Engineering, Tohoku University
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Ootubo Junichi
Department Of Nuclear Engineering Faculty Of Engineering Tohoku University
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Yamaguchi Sadae
Institute For Materials Research Tohoku University
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粕壁 善隆
Department Of Quantum Science And Energy Engineering Tohoku University
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Kasukabe Yoshitaka
Department Of Materials Science And Enginnering Waseda University
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Kishimoto M
Institute For Mateials Research Tohoku University
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Yamada Yukio
Department Of Mechanical Engineering And Intelligent Systems University Of Electro-communications
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Yamada Yukio
Department Of Biochemistry Chiba University School Of Medicine
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Yokoyama Yoshihiko
Superconductivity Research Laboratory, International Superconductivity Technology Center
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