光電子制御プラズマCVDによる多層グラフェンの結晶性と電気特性： H2とArキャリアガスの比較

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Networked nanographite (NNG) was grown by using photoemission-assisted plasma enhanced chemical vapor deposition (CVD) on SiO2 (90 nm) /Si substrates and the career gas dependence of electric resistivity, chemical configuration, and grain size was investigated from Raman spectroscopy, SIMS, and four probes method. In this study, CH4/Ar and CH4/H2 gases were used. NNG with the thickness from 2∼60 nm was grown by changing the growth period. Resistivity of thin films showed clearly decreases in CH4/H2 in an order of magnitude nevertheless their grain sizes were almost same at the length of 9 nm. From SIMS measurement, hydrogen concentration of the sample grown by CH4/H2 was 3 times less than that of by CH4/Ar. From these results, it is found that hydrogen termination at grain boundary is the cause of low electric conductivity, and H radicals in CH4/H2 plasma may remove the terminated hydrogen by H abstraction reaction in CVD process.
公益社団法人日本表面科学会の論文