電子線干渉法による磁性材料観察
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概要
- 論文の詳細を見る
電子線ホログラフィー、ローレンツ顕微鏡法など電子線干渉を用いた磁性材料の観察に関して、原理と手法を中心に、応用例とともに紹介いたします。
- 公益社団法人 日本表面科学会の論文
- 2011-05-25
著者
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Aoki Hidemitsu
Department of Electrical Electronic and Information Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan
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Kimura Chiharu
Department of Electrical Electronic and Information Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan
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Kawase Yasuhiro
Semiconductor Materials Laboratories, Mitsubishi Chemical Corporation, Kitakyushu 806-0004, Japan
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Hara Makoto
Department of Electrical, Electronic and Information Engineering, Osaka University, Suita, Osaka 565-0871, Japan
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Ito Atsushi
Semiconductor Materials Laboratories, Mitsubishi Chemical Corporation, Kitakyushu 806-0004, Japan
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Suzuki Toshiyuki
Semiconductor Materials Laboratories, Mitsubishi Chemical Corporation, Kitakyushu 806-0004, Japan
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Sakae Rina
Department of Electrical, Electronic and Information Engineering, Osaka University, Suita, Osaka 565-0871, Japan
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原田 研
Semiconductor Materials Laboratories, Mitsubishi Chemical Corporation, Kitakyushu 806-0004, Japan
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- 電子線干渉法による磁性材料観察