Free-Radical Chlorination of Alkylsilanes. VI. The Hydrogen Abstraction from α-Substituted Hydrosilanes by Chlorinated Methyl Radicals
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概要
- 論文の詳細を見る
Relative rates of hydrogen abstraction from Si-H bonds of α-substituted hydrosilanes by the trichloromethyl or the dichloromethyl radical were determined by allowing the hydrosilanes to compete in pairs for a chlorocarbon compound, carbon tetrachloride or chloroform, at 80°C in the presence of benzoyl peroxide. Results show that relative rates of the investigated hydrosilanes toward the trichloromethyl and the dichloromethyl radicals are satisfactorily correlated with the summation of Taft σ values for the substituent on the central silicon atom, giving ρ values of −0.11 and −0.08, respectively. Linear correlations are also found to exist between the relative rates and the <SUP>29</SUP>Si-H coupling constants.
- 公益社団法人 日本化学会の論文
著者
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Matsumoto Hideyuki
Department Of Applied Chemistry Faculty Of Engineering Gunma University
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Tajima Eiji
Department Of Urology Tokyo Metropoiltan Kiyose Children's Hospital
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Watanabe Hamao
Department Of Chemistry (materials Science) Faculty Of Engineering Gunma University
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Hayashi Masaki
Department Of Applied Physics Tokai University
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Nagai Yoichiro
Department of Chemistry, Gunma University
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Nagai Yoichiro
Department of Applied Chemistry, Faculty of Engineering Gunma University
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Hayashi Masaki
Department of Chemistry, Gunma University
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Matsumoto Hideyuki
Department of Chemistry, Gunma University
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Tajima Eiji
Department of Chemistry, Gunma University
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Watanabe Hamao
Department of Applied Chemistry, Faculty of Engineering Gunma University
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