Photolysis of anti-Dodecaalkyltricyclo[4.2.0.0^<2,5>]octasilane : Generation and Reactions of Cyclotetrasilene
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概要
- 論文の詳細を見る
- 2000-05-05
著者
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Meguro Akira
Department Of Applied Chemistry Faculty Of Engineering Gunma University
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MATSUMOTO Hideyuki
Department of Chemical Engineering, Graduate School of Science and Engineering, Tokyo Institute of T
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Matsumoto H
Faculty Of Engineering Nagasaki University
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Handa Makoto
Department Of Chemistry Faculty Of Science Shimane University
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KYUSHIN Soichiro
Department of Applied Chemistry, Faculty of Engineering, Gunma University
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UNNO Masafumi
Department of Applied Chemistry, Faculty of Engineering, Gunma University
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Matsumoto Hideyuki
Department Of Applied Chemistry Faculty Of Engineering Gunma University
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Unno M
Department Of Nano-material Systems Graduate School Of Engineering Gunma University
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Unno Masafumi
Department Of Applied Chemistry Faculty Of Engineering Gunma University
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Kyushin S
Department Of Applied Chemistry Faculty Of Engineering Gunma University
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Kyushin Soichiro
Department Of Applied Chemistry Faculty Of Engineering Gunma University
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Morishita Hiroaki
Department Of Chemistry School Of Science Kwansei Gakuin University
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