カルーセルスパッタ法で作製した高異方性磁界を持つCoFeB膜におけるスパッタ粒子の異方性入射効果

概要

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(Co35Fe65)B magnetic films with an Ru underlayer were fabricated and characterized using a triple carrousel sputtering method. The high velocity movement of a substrate brought that the Ru underlayer and B enhanced uniaxial anisotropy field with increasing elongation of the lattice parameter, preferred orientation in the CoFe crystalline bct phase. In this study, we examined the uniaxial anisotropy field by using a simulator of sputtering particles deposited on a substrate moving at high velocity. As a result, we found that an anisotropic incidence existed. The simulation result suggested that sputtered Fe and Co particles in the range of energy had the potential of those oblique incident in the direction of the substrate movement.
社団法人　日本磁気学会の論文