Studies of a Reactive Sputter Ion Plating for Preparation of TiN Films Using a Facing Target Sputter and Immersed Inductive Coupled Plasma Source

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2002-11-15

著者

• 成 烈

  Dep. Of Electrical And Electronic Engineering Univ. Of Miyazaki Miyazaki 889-2192 Jpn

• 成 烈〓

  宮崎大学大学院工学研究科

• SUNG Youl-Moon

  Department of Electrical Electronic Engineering, Kyungsung University

• OTSUBO Masahisa

  Department of Electrical and Electronic Engineering, University of Miyazaki

• HONDA Chikahisa

  Department of Electrical and Electronic Engineering, University of Miyazaki

• PARK Chung-Hoo

  Department of Electrical Engineering, Pusan National University

• Park Chung-hoo

  Department Of Electrical Engineering Pusan National University

• Sung Youl-moon

  Department Of Electrical And Electronic Engineering Miyazaki University

• Otsubo Masahisa

  Miyazaki University

• Otsubo Masahisa

  Department Of Electrical Engineering Faculty Of Engineering Miyazaki University

• Honda Chikahisa

  Department Of Electrical And Electronic Engineering University Of Miyazaki

• Honda Chikahisa

  Department Of Energy Conversion Graduate School Of Engineering Sciences Kyushu University

• Otsubo M

  Department Of Electrical And Electronic Engineering University Of Miyazaki

• Otsubo Masahisa

  Department Of Electrical And Electronic Engineering Faculty Of Engineering University Of Miyazaki

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