NLDプラズマ生成技術を用いたスパッタリングへの応用

概要

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Abstract A new type of plasma system based on the Magnetic Neutral Loop Discharge (NLD) concept has been developed for sputter application. The electron density and ion current density possessing peaks at the null region, it was ascertained that the electron heating around null region is also essential for plasma production in this capacitive type null field configuration. Also, two distinctive factors, such as secondary electrons trapping and normalized electric field (F) were found to explain the measured profile of the electron temperature. From the thin film experiments, it could be found that the thickness uniformity was well enhanced with the substrate rotation and dynamical plasma control although further detail work is necessary to establish this. Furthermore, it is expected that the dynamic control of plasma over the target surface will be realized, because rotating and arranging the outer permanent magnets can actively control the position and area of magnetic null field region. With plasma application, the enhancement of target erosion and its uniformity are possible. Although further work is necessary to establish the plasma dynamic control, this magnetic null discharge concept is expected realize very uniform processing over a large area.
宮崎大学の論文