Oxygen Plasma Damage in GaAs Directly Exposed to Surface-Wave Plasma
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2002-09-15
著者
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Aoki K
Texas Instruments Japan Ltd. Ibaraki Jpn
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UEKUSA Shin-ichiro
Department of Electronics and Communication, School of Science and Technology, Meiji University
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Katsumata Hiroshi
Corporate Manufacturing Engineering Center Toshiba Corporation
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Katsumata Hiroshi
Electrotechnical Laboratory:meiji University
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Katsumata Hiroshi
Corporate Manufacturing And Engineering Center Toshiba Corp.
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Uekusa Shin-ichiro
Department Of Electrical Engineering School Of Science And Technology Meiji University
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Uekusa Shin-ichiro
School Of Engineering Meiji University
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Uekusa Shin-ichiro
Department Of Electrical And Electronic Engineering Meiji University
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Aoki K
Toshiba Corp. Yokohama Jpn
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Uekusa S
Meiji Univ. Kawasaki Jpn
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AOKI Katsuaki
Corporate Manufacturing Engineering Center, Toshiba Corporation
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Aoki Katsuaki
Corporate Manufacturing Engineering Center Toshiba Corporation
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