2108 半導体露光装置におけるディストーション補正の最適化(OS21 設計と最適化II)

概要

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In this paper consider the problem of lens distortion calibration of semiconductor lithography equipment. The target of calibration is to minimize the maximum absolute value of the distortion. Formerly, approximate solution used to be calculated by the least-squares method. Recently, iterating the least-squares method with weight was proposed. However, calculation time may often become long and a better solution was desired. In this paper we propose application of "the maximum absolute value minimization by linear programming." With this method, we have been successful in decreasing 15 data of experimental distortion about 40% smaller than the calibration with least-squares method. In addition, this solution is assured to be the exact optimal solution, and the calculation time is very small.
一般社団法人日本機械学会の論文
2005-08-02