制約2次計画法および2次錐計画法を用いた半導体露光装置用レンズの最適調整(機械力学,計測,自動制御)

概要

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In this paper, we consider an optimization problem of lens adjustment in semiconductor lithography equipment. The problem to obtain optimal adjustment of lens can be naturally formulated as a convex minimization problem. However, in such a formulation the objective function is convex but contains many nondifferentiable points, and thus methods based on derivatives cannot be applied. Other approaches using derivative-free optimization or meta-heuristic methods cannot guarantee that obtained solutions are truly optimal. From such a background, we formulate the problem as quadratically constrained and second-order cone programming problems, which can be handled by solvers using an interior point method. With the proposed formulations, computational simulations show that optimal adjustment of lens is obtained in a practical computational time.
社団法人日本機械学会の論文
2009-01-25