Preparation of Layer-Structured CaBi_2Ta_2O_9 Ferroelectric Thin Films through a Triple Alkoxide Route
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-09-30
著者
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Miki T
Multifunctional Material Science Department National Industrial Research Institute Of Nagoya
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KATO Kazumi
National Institute of Advanced Industrial Science and Technology (AIST)
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NISHIZAWA Kaori
National Institute of Advanced Industrial Science and Technology
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MIKI Takeshi
National Institute of Advanced Industrial Science and Technology
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SUZUKI Kazuyuki
National Institute of Advanced Industrial Science and Technology
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Kato Kazumi
National Inst. Of Advanced Industrial Sci. And Technol. (aist)
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Suzuki K
Precision Equipment Company Nikon Corporation
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Miki T
Yamaguchi Univ. Ube Jpn
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Kato K
Department Of Materials Science Faculty Of Engineering Kitami Institute Of Technology
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Suzuki K
Display Materials And Devices Laboratory Corporate Research And Development Center Toshiba Corporati
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Kato Kazumi
National Industrial Research Institute Of Nagoya
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Kato Kazumi
National Institute Of Advanced Industrial Science And Technology
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NISHIZAWA KAORI
National Industrial Research Institute of Nagoya
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