Morphology of Silicon Oxide Film on Silicon Wafer Surface during Its Removal Process in a Hydrogen Ambient : Surfaces, Interfaces, and Films
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2001-11-15
著者
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HABUKA Hitoshi
Department of Chemical Engineering Science, Yokohama National University
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Imai Masato
Super Silicon Research Institute Corp.
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Habuka Hitoshi
Department Of Chemical Engineering Science Yokohama National University
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Nakahara Shinji
Super Silicon Research Institute Corp.
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MAYUSUMI Masanori
Super Silicon Research Institute Corp.
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INOUE Kazutoshi
Super Silicon Research Institute Corp.
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Habuka Hitoshi
Department of Chemical and Energy Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya, Yokohama 240-8501, Japan
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