Flatness Deterioration of Silicon Epitaxial Film Formed Using Horizontal Single-Wafer Epitaxial Reactor : Surfaces, Interfaces, and Films

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2001-10-15

著者

• HABUKA Hitoshi

  Department of Chemical Engineering Science, Yokohama National University

• Habuka Hitoshi

  Department Of Material Science And Chemical Engineering Faculty Of Engineering Yokokama National Uni

• Habuka Hitoshi

  Department Of Chemical Engineering Science Yokohama National University

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• Water Motion in a Water Curtain Head for Cleaning a Large Glass Plate
• Air Flow in Square Quartz Plate Spin Cleaner
• Flatness Deterioration of Silicon Epitaxial Film Formed in a Horizontal Single-Wafer Epitaxial Reactor II
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• Morphology of Silicon Oxide Film on Silicon Wafer Surface during Its Removal Process in a Hydrogen Ambient : Surfaces, Interfaces, and Films
• Flatness Deterioration of Silicon Epitaxial Film Formed Using Horizontal Single-Wafer Epitaxial Reactor : Surfaces, Interfaces, and Films
• Time-Dependent Airborne Organic Contaimination on Silicon Wafer Surface Stored in a Plastic Box
• Hafnium Oxide Film Etching Using Hydrogen Chloride Gas
• Silicon Carbide Etching Using Chlorine Trifluoride Gas
• Determination of Etch Rate Behavior of 4H–SiC Using Chlorine Trifluoride Gas
• A Practical Design Method for a Rapid Thermal Processing System
• Water Motion in a Water Curtain Head for Cleaning a Large Glass Plate
• Time-Dependent Airborne Organic Contamination on Silicon Wafer Surface Stored in a Plastic Box
• Heat Transport Analysis for Flash Lamp Annealing
• Highly Concentrated Ozone Gas for Preparing Wettable Polyimide Surface
• Carbonation/Decarbonation of Ca-Solid Reactant Derived from Natural Limestone for Thermal-Energy Storage and Temperature Upgrade

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