Room Temperature Halogenation of Polyimide Film Surface using Chlorine Trifluoride Gas
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概要
- 論文の詳細を見る
In order to develop a new application of chlorine trifluoride gas, the halogenation of a polyimide film surface at room temperature and at atmospheric pressure is studied for the first time. The polyimide film surface after exposure to the chlorine trifluoride gas shows a decreased water contact angle with increasing chlorine trifluoride gas concentration and exposure period. Since both X-ray photoelectron spectroscopy and infrared absorption spectroscopy simultaneously showed the formation of a carbon-chlorine bond and carbon-fluorine bond, it is concluded that the chlorine trifluoride gas can easily and safely perform the halogenation of the polyimide film surface under the stated conditions using a low-cost process and equipment.
- 2004-02-15
著者
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AIDA Toshihiro
Electric Gases Department, Iwatani International Corp.
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Kosuga Takahiro
Department Of Chemical Engineering Science Yokohama National University
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Aihara Masahiko
Department Of Chemical Engineering Science Yokohama National University
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Koike Kunihiko
Shiga Technology Center Iwatani International Corp
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Takeuchi Takashi
Department Of Chemical Engineering Science Yokohama National University
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Aihara Masahiko
Department of Chemical Engineering Science, Yokohama National University, 79-5 Tokiwadai, Hodogaya, Yokohama, Kanagawa 240-8501, Japan
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Aida Toshihiro
Electric Gases Department, Iwatani International Corp., 3-21-8 Nishi-Shimbashi Minato-ku, Tokyo 105-8458, Japan
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Kosuga Takahiro
Department of Chemical Engineering Science, Yokohama National University, 79-5 Tokiwadai, Hodogaya, Yokohama, Kanagawa 240-8501, Japan
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Habuka Hitoshi
Department of Chemical Engineering Science, Yokohama National University, 79-5 Tokiwadai, Hodogaya, Yokohama, Kanagawa 240-8501, Japan
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Habuka Hitoshi
Department of Chemical and Energy Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya, Yokohama 240-8501, Japan
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