Synthesis of Nb_3Al Thin Films by Magnetron Sputtering
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概要
- 論文の詳細を見る
Nb_3Al thin films with the highest T_c (16.7 K) among as-sputtered films ever reported have been prepared by magnetron sputtering from an arc-melted target. Metallurgical phases, lattice constants, and superconducting T_c's of films were determined as a function of substrate temperature and Ar pressure. Maximum T_c's were found in the films deposited at 650-700℃, which have an Al5 structure with a slight amount of Nb_2Al phase. For films deposited at Ar pressures lower than l0Pa, a systematic decrease in T_c was found. This result suggests the importance of thermalization and low substrate bombardment in obtaining high-T_c as-sputtered Nb_3Al thin films.
- 社団法人応用物理学会の論文
- 1981-05-05
著者
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Tanabe Keiichi
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Michikami Osamu
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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