Nb/Nb oxide/Pb Josephson Tunnel Junctions Fabricated Using CF_4 Cleaning Process
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概要
- 論文の詳細を見る
Effects of an Ar and CF_4 RF plasma mixture, in which the base electrode surface was cleaned prior to oxide barrier formation, on Nb/Nb oxide/Pb Josephson tunnel junction characteristics have been investigated. Good quality junctions with less leakage current (V_m=39.3mV) and no knee at voltages just above the gap voltage have been obtained using the CF_4 cleaning process (CFCP). It is speculated that the chemical etching reaction and a carbon layer generated on the cleaned Nb surface by CF_4 plasma play an important role in achieving a cleaned based electrode surface free from damage and the formation of a good quality oxide tunnel barrier, respectively.
- 社団法人応用物理学会の論文
- 1983-02-20
著者
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Yoshii Shizuka
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Yoshii Shizuka
Ibaraki Electrical Communication Laboraroty Nippon Telegraph And Telephone Public Corporation
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Katoh Yujiro
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Michikami Osamu
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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