Michikami Osamu | Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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概要
- 同名の論文著者
- Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporationの論文著者
関連著者
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Michikami Osamu
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Tanabe Keiichi
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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MICHIKAMI Osamu
Ibaraki Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
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Tanabe K
Superconductivity Research Laboratory Istec
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Tanabe Keiichi
Ntt Electrical Communications Laboratories
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Takenaka Hisataka
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Katoh Yujiro
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Michikami O
Iwate Univ. Morioka‐shi Jpn
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Asano Hidefumi
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Katoh Y
Ntt Opto-electronics Laboratories
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Maeda Y
Deparment Of Information And Control Engineering Toyota Technological Institute
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Takenaka Hisataka
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation Tokai
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Maeda Y
Center For Microelectronic Systems Kyushu Institute Of Technology
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Maeda Y
The Institute Of Scientific And Industrial Research Osaka University
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NAKAMURA Kiko
Ibaraki Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
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ASANO Hidefumi
Ibaraki Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
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MAEDA Yasushi
Ibaraki Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
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Nakamura Kiko
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Kato Yujiro
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Yoshii Shizuka
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Yoshii Shizuka
Ibaraki Electrical Communication Laboraroty Nippon Telegraph And Telephone Public Corporation
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Beasley Malcolm
Department Of Applied Physics Stanford University
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Beasley Malcolm
Departments Of Applied Physics And Electrical Engineering Stanford University
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Michikami Osamu
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation Tokai
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IGARASHI Masaru
Ibaraki Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
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Maeda Yasushi
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Igarashi Masaru
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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TANABE Keiichi
Ibaraki Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
著作論文
- Tunneling Measurements on A15 Nb-Si Films
- Properties of Nb_3Al Thin Films Sputter-Deposited on Sapphire Substrates
- Composition Deviation in Nb_3Al Thin Films Sputter-Deposited at High Substrate Temperatures
- AES Analysis of Nb_3Al Thin Films Sputter-Deposited on Oxidized Silicon Substrates
- V_3Si Thin-Film Synthesis by Magnetron Sputtering
- Nb-Oxide-Pb Josephson Tunnel Junctions Fabricated Using CF_4 Cleaning Process (II)
- Internal Stress in V_3Si Thin Films Prepared by Magnetron Sputtering
- Thermal Annealing of Amorphous V_3Si Thin Films
- Fluoride Barriers in Nb/Pb Josephson Junctions
- Fabrication of A15 Nb_3Al Josephson Tunnel Junction using CF_4 Cleaning Process
- An Ellipsometric Study of Oxide Growth on Nb, Al and Nb_3Al Films by rf Plasma
- Nb/Nb oxide/Pb Josephson Tunnel Junctions Fabricated Using CF_4 Cleaning Process
- Study on the Constriction Resistance of Electric Contact
- Synthesis of Nb_3Al Thin Films by Magnetron Sputtering