Nb-Oxide-Pb Josephson Tunnel Junctions Fabricated Using CF_4 Cleaning Process (II)
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概要
- 論文の詳細を見る
The rf plasma cleaning conditions using a CF_4 cleaning process (CFCP) giving high-quality junctions are discussed. The C-F radical chemical reaction provides a clean, damage-free Nb surface which is protected from oxygen dissolution by a carbon layer. The carbon layer is possibly effective in forming a high-quality tunnel oxide. The dependence of the maximum dc Josephson current on an external magnetic field shows a uniform current distribution. The total critical current spread was measured in arrays of 50 series-connected junctions with an arca of 10×10 μm^2 and was found to be within ±2.5% for the best samplle at a mean current density of 10.6 kA/cm^2.
- 社団法人応用物理学会の論文
- 1984-05-20
著者
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Kato Yujiro
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Michikami Osamu
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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