AES Analysis of Nb_3Al Thin Films Sputter-Deposited on Oxidized Silicon Substrates
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1982-06-20
著者
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Tanabe Keiichi
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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MICHIKAMI Osamu
Ibaraki Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
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Michikami Osamu
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
関連論文
- Tunneling Measurements on A15 Nb-Si Films
- Properties of Nb_3Al Thin Films Sputter-Deposited on Sapphire Substrates
- Composition Deviation in Nb_3Al Thin Films Sputter-Deposited at High Substrate Temperatures
- AES Analysis of Nb_3Al Thin Films Sputter-Deposited on Oxidized Silicon Substrates
- V_3Si Thin-Film Synthesis by Magnetron Sputtering
- Nb-Oxide-Pb Josephson Tunnel Junctions Fabricated Using CF_4 Cleaning Process (II)
- Internal Stress in V_3Si Thin Films Prepared by Magnetron Sputtering
- Thermal Annealing of Amorphous V_3Si Thin Films
- Fluoride Barriers in Nb/Pb Josephson Junctions
- Fabrication of A15 Nb_3Al Josephson Tunnel Junction using CF_4 Cleaning Process
- An Ellipsometric Study of Oxide Growth on Nb, Al and Nb_3Al Films by rf Plasma
- Nb/Nb oxide/Pb Josephson Tunnel Junctions Fabricated Using CF_4 Cleaning Process
- Study on the Constriction Resistance of Electric Contact
- Synthesis of Nb_3Al Thin Films by Magnetron Sputtering