Fluoride Barriers in Nb/Pb Josephson Junctions
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概要
- 論文の詳細を見る
Josephson tunnel junctions are fabricated using a new class of artificial barriers, metal fluorides (Al fluoride and Zrfluoride). These fluoride barriers are deposited on the surface of a Nb base electrode, which are previously cleaned usinga CF_4. cleaning process, and covered by a Pb counterelectrode. The junctions with both AN fluoride and Zr fluoride bar-riers exhibit good tunneling characteristics and have low specific capacitance. In the case of Zr fluoride, it is observedthat reasonable resistances are obtained even at thickness greater than 100 A. This phenomenon might be explained bytunneling via localized states in Zr fluoride.
- 社団法人応用物理学会の論文
- 1985-03-20
著者
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Tanabe K
Superconductivity Research Laboratory Istec
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Tanabe Keiichi
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Tanabe Keiichi
Ntt Electrical Communications Laboratories
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Asano Hidefumi
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Beasley Malcolm
Department Of Applied Physics Stanford University
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Beasley Malcolm
Departments Of Applied Physics And Electrical Engineering Stanford University
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Michikami O
Iwate Univ. Morioka‐shi Jpn
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Michikami Osamu
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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IGARASHI Masaru
Ibaraki Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
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Igarashi Masaru
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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