P-Type Polysilicon Processing Temperature Reduction Using In Situ Boron-Doped Amorphous Silicon
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-05-01
著者
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Hiraiwa A
Hitachi Ltd. Tokyo Jpn
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Hiraiwa Atsushi
Central Research Laboratory Hitachi Ltd.
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KOBAYASHI Takashi
Central Research Laboratory, Hitachi Ltd.
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Kobayashi Takashi
Central Research Laboratory Hitachi Ltd.
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IIJIMA Simpei
Central Research Laboratory, Hitachi Ltd.
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Iijima Simpei
Central Research Laboratory Hitachi Ltd.
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- P-Type Polysilicon Processing Temperature Reduction Using In Situ Boron-Doped Amorphous Silicon
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