Smoothing Roughness of SiC Membrane Surface for X-Ray Masks : X-Ray Lithography

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1992-04-30

著者

• Yamaguchi Y

  Core Technology Laboratory Mitsui Kinzoku

• Sugawara M

  Fujitsu Laboratories Ltd.

• Yamaguchi Y

  Fuji Xerox Co. Ltd. Kanagawa Jpn

• YAMASHIRO Kazuhide

  Materials Research laboratory, HOYA Corporation

• SUGAWARA Minoru

  Materials Research laboratory, HOYA Corporation

• NAGASAWA Hiroyuki

  Materials Research laboratory, HOYA Corporation

• YAMAGUCHI Yoh-ichi

  Materials Research laboratory, HOYA Corporation

• Sugawara M

  Semiconductor Company Sony Corporation

• Sugawara M

  Fujitsu Limited And Fujitsu Laboratories Limited

• Yamashiro Kazuhide

  Materials Research Laboratory Hoya Corporation

• Nagasawa H

  Osaka Prefecture Univ. Osaka Jpn

• Yamaguchi Yoh-ichi

  Materials Research Laboratory Hoya Corporation

• Nagasawa Hiroyuki

  Materials Research Laboratory Hoya Corporation

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• Smoothing Roughness of SiC Membrane Surface for X-Ray Masks : X-Ray Lithography
• Smoothing Roughness of SiC Membrane Surface for X-Ray Masks
• Practical Optical Proximity Effect Correction Adopting Process Latitude Consideration
• New Systematic Evaluation Method for Attenuated Phase-Shifting Mask Specifications
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