A Probe for Measurements of Negative and Positive Ions in a Plasma
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1985-04-20
著者
-
ITATANI Ryohei
Niihama National College of Technology
-
Namura T
Kyoto Research Laboratory Matsushita Electronics Corporation
-
Itatani R
Niihama National Coll. Technol. Ehime Jpn
-
Itatani Ryohei
Department Of Electronics Kyoto University
-
ARIKATA Ichio
Himeji Institute of Technology,Shosha
-
MURAKAMI Tetsuro
Himeji Institute of Technology,Shosha
-
NAMURA Takashi
Department of Electronics,Kyoto University
-
Itatani Ryohei
Department Of Electonics Kyoto University
-
Murakami Tetsuro
Himeji Institute Of Technology
関連論文
- An Explanation of the Suppression of Instabilities by the Beam Modulation
- Suppression of Instabilities in a Beam-Plasma System by a Modulation of the Electron Beam
- Dependences of Amplitudes of Electron Waves and Growth Rates of Ion-Acoustic Waves on Boundary Conditions in a Beam-Plasma System
- Development and Plasma Characteristics Measurement of Planar-Type Magnetic Neutral Loop Discharge Etcher
- Evaluation of Device Charging in Ion Implantation : Ion Beam Process
- Evaluation of Device Charging in Ion Implantation
- Numerical Properties of Particle Simulation Model for Warm Magnetized Plasmas
- Quantitative Charge Build-Up Evaluation Technique by Using MOS Capacitors with Charge Collecting Electrodes in Wafer Processing (Special Issue on Microelectronic Test Structure)
- Effects of permanent magnet arrangements and antenna locations on the generation of multicusp electron cyclotron resonance plasma
- Charge Buildup in Magnetized Process Plasma
- Experimental and Theoretical Study of the Charge Build-Up in an ECR Etcher : Etching and Deposition Technology
- Experimental and Theoretical Study of the Charge Build-Up in an ECR Etcher
- Destruction of Magnetic Surfaces near a Separatrix of a Stellarator Attributed to Perturbations of Magnetic Fields
- Computer Simulation of RF-Confinement of Plasmas in an Open-Ended Toroidal Quadrupole
- A Novel and Convenient Method for Monitoring Processing Plasma : The Insulated Pulse Probe Method
- High Order Spline Interpolations in the Particle Simulation
- Competition of Weakly Collisional and Neighboring Wave Effects for the Destruction of Amplitude Oscillations
- The Properties of Collision in the Plasma Composed of the Finite-Sized Particles of 2-Species
- The Effect of Oxygen on the Delay Time of Flashover by a Laser-Produced Plasma
- Positional Instabilities in a Tokamak with a Resistive Shell
- Positional Instabilities in a Shell-Less Tokamak
- Performance of Electron Cycrotron Resonance Plasma Produced by a New Microwave Launching System in a Multicusp Magnetic Field with Permanent Magnets
- Simple Monitoring Method for RF Plasmas by the Insulated Pulse Probe Method
- On the Effect of Film Deposition on Probe Surface in Measurement by the Insulated Pulse Probe Method(Nuclear Science, Plasmas, and Electric Discharges)
- Insulated Modulation Probe Method for Monitoring RF Plasmas
- Insulated Probe Method Using Transmission Line for Monitoring RF Plasmas
- A Probe for Measurements of Negative and Positive Ions in a Plasma
- Abatement of CF4 Using Atmospheric Pressure discharge Plasma
- Excitation of Flute-Type Negative-Energy Ion-Cyclotron Waves due to Ion Gradient-B Drifts in High-β Mirror-Comfined Plasmas
- Propagation of Drift Waves in a Cylindrical Plasma
- Deformation of the Electron Beam Distribution Function and Suppression of Electron Waves
- Collisional Diffusion in a Toroidal Pinch
- Spatial Damping of Ion Acoustic Waves at a Turbulent State
- Nonequilibrium Argon Induction Plasmas by a Two-Temperature Model
- Multivaluedness of the Elenbaas-Heller Solution for Positive Columns of Some Molecular Gas Discharges at 1.0 Atm