Theoretical Study of Latent Image Formation in Chemically Amplified Resists

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Superior Decomposition of N_2O into N_2 and O_2 in a Fast Discharge Flow of N_2O/He or N_2O/Ar Mixtures
Hall Effect Studies on Ar and Xe Sputtered Pt/Co Multilayer Films : Media
Hall Effect Studies on Ar and Xe Sputtered Pt/Co Multilayer Films
Lithographic Performance of a Chemically Amplified Resist Developed for Synchrotron Radiation Lithography in the Sub-100-nm Region
Dissolution Characteristics and Surface Morphology of Chemically Amplified Resists in X-Ray Lithography
Liquid Phase Epitaxial Growth of (3GaAs)_x{(3ZnSe)_y(Ga_2Se_3)_}_ Alloy
LPE Growth of (3GaAs)_x{(3ZnSe)_y(Ga_2Se_3)_}_ Alloy
Growth of GaAsP on GaP by Compositional Conversion
liquid Phase Epitaxy of GaAs by Yo-yo Solute Feeding Method
Phantom Exposure of Chemically Amplified Resist in KrF Excimer Laser Lithography
Advances in Patterning Characteristics of Chemically Amplified Resists with an Organic Base
Homogeneous GaInSb Bulk Alloy Pulling by Solute-Feeding Czochralski Method
High Storage Density Optical Recording with a Stable Micro Green Second Harmonic Generation Laser Consisting of Nd:YVO4 and KTP : High Density Recording
High Storage Density Optical Recording with a Stable Micro Green Second Harmonic Generation Laser Consisting of Nd:YVO_4 and KTP
New Resist Technologies for 0.25-μm Wiring Pattern Fabrication with KrF Lithography
Spatial Frequency Doubling Method by Image Superimposition for Sub-0.15-μm Optical Lithography
Spatial Frequency Doubling Method for Sub-0.15-μm Optical Lithography
Effect of Overcoats in Chemically Amplified Resists against Water and Organic Bases
Enhancement of Etch Rate by the Addition of O_2 and Ar in Chemical Dry Etching of Si Using a Discharge Flow of Ar/CF_4 and CF_4/O_2 Gas Mixtures
Downflow Etching of Si Using a Microwave-Excited Discharge Plasma of Ar/CF_4 Mixtures
An Efficient Decomposition of NO into N_2 and O_2 in a Fast Discharge Flow of NO/He Mixtures
Chemical Dry Etching of Si Substrate in a Discharge Flow Using Ar/CF_4 Gas Mixtures
Surface of Bi_2Sr_2CaCu_2O_y Single Crystals Heated in Air
Growth of Bi_2Sr_2CaCu_2O_y Single Crystals Using a Vertical Bridgmam Method
Effect of Dissociation Constant of Catalytic Acids on the Characteristics of Chemically Amplified Resists
The Effect of an Organic Base in Chemically Amplified Resist on Patterning Characteristics Using KrF Lithography
Metal-Free Acid Generators for Chemically Amplified Monodispersal Polyhydroxystyrene-Based Positive Resist and Post-Exposure Delay Problem
Theoretical Study of Latent Image Formation in Chemically Amplified Resists
Pattern Fabrication of Chemically Amplified Resist on an Interdigitated Array Electrode
Characteristics of a Monodisperse PHS-Based Positive Resist (MDPR) in KrF Excimer Laser Lithography
Influence of Acid Diffusion on the Lithographic Performance of Chemically Amplified Resists
Characteristics of an Chemically Amplified Silicone-Based Negative Resist (CSNR) in Electron Beam Lithography
Modification of E-Beam Latent Images in Negative Resist by Exposure to Monochromatic Deep UV Flood Light
Effect of Acid Diffusion on Resolution of a Chemically Amplified Resist in X-Ray Lithography
Alkali-Developable Silicone-Based Negative Photoresist (SNP) for Deep UV, Electron Beam, and X-Ray Lithographies
Resist Surface Roughness Calculated Using Theoretical Percolation Model
Barrier Height of InP Schottky Diodes Prepared by Means of UV Oxidation

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