Growth of Amorphous Germanium Whiskers
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1977-10-05
著者
-
Tatsumi Yukichi
Department Of Physics College Of General Education Osaka University
-
HIRATA Mitsuji
Department of Physics,College of General Education,Osaka University
-
Hirata Mitsuji
Department Of Physics Boston College:(permanent Address)department Of Physics Osaka University
-
SHIGI Mikio
Department of Metal Physics, Faculty of Engineering Science, Osaka University
関連論文
- Crystallization of Amorphous Si and Ge Whiskers
- Annealing of Defects Formed in Germanium After Irradiations with Particles of Various Energies
- The E_c-0.2 eV Level in Irradiated n-Type Germanium
- Shallow Traps in p-Type Germanium Converted from n-Type by Electron Irradiation
- 80°K -140°K Annealing Stage of p-Type Germanium after Irradiation with 1.5 Me V Electrons at 77°K
- Possibility of Di-Vacancy Migration at 0℃ in Irradiated Germanium
- Annealing of Irradiated Silicon Containing Phosphorus Atoms
- Effects of Gamma Irradiation on Minority Carrier Lifetime in Germanium Single Crystals
- Acceptor Impurity Associated Dffects in Silicon
- Recovery Stages by Lifetime Measurements in Irradiated P-Type Silicon
- Characteristics of Whisker Growth in Amorphous Silicon
- Visual Observation of Whisker Growth in Amorphous Silicon
- Measurement of Young's Modulus in Amorphous Silicon Whiskers
- Growth of Amorphous Germanium Whiskers
- Recovery Spectra of Conductivity and Carrier Lifetime in Germanium Bombarded with Electrons of 1.5 MeV or Co 60 Gamma Rays
- Recovery Spectra of N-Type Germanium Bombarded with Electrons of 1.5 MeV at 77 K
- Atomic Structure of a Defect Colony in Silicon Introduced during Neutron Irradiation in the JOYO Reactor
- Amorphous Silicon Fibers Grown by Thermal Decomposition of SiH_4
- Reverse Annealing Stage in Irradiated Germanium Containing Arsenic
- Growth of Amorphous Silicon Fibers
- Transmission Electron Diffraction Pattern of Electron-Irradiation-Induced {113}-Faulted Loops in Si
- Electron-Bombardment Induced Annealing Stages in N-Type Germanium I
- Role of Agents in Filamentary Growth of Amorphous Silicon
- The Interactions of Point Defects with Impurities in Silicon
- Diffusion Process of Interstitial Atoms in an Electron Irradiated InP Studied by Transmission Electron Microscopy
- Growth of New Form Germanium Whiskers
- Vacancy Capture Radii of Impurity Atoms in Silicon
- Electron-Bombardment Induced Annealing Stages in n-Type Germanium II