X-Ray Diffraction Topography Utilizing Double-Crystal Arrangement of (+, +) or Non-Parallel (+, -) Setting
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概要
- 論文の詳細を見る
A potential utility of the double-crystal arrangement of (+, +) or non-parallel (+, -) setting for obtaining a diffraction topograph is studied. The method is simple in mechanism and enables us to obtain well-defined images of imperfections from a large area of a specimen without any scanning mechanism in a rather short exposure time. Differing from the double-crystal arrangement of the parallel setting usually used, the present method allows us to obtain topographs for any reflection of any kinds of crystals irrespectively of the first crystal. For the first crystal is employed the asymmetric 111 reflection of a nearly perfect Ge crystal to take photographs from a large area in a rather short exposure time by using a usual sealed-off X-ray tube. As examples are shown some transmission topographs taken with Cub_<α1> from a LiF crystal, and Si web crystals as grown and after heat-treated.
- 社団法人応用物理学会の論文
- 1970-09-05
著者
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Kohra Kazutake
Department Of Applied Physics Faculty Of Engineering University Of Tokyo
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Kohra Kazutake
Department Of Applied Physics Faculty Of Engineering The University Of Tokyo
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Yoshimura Jun-ichi
Department Of Applied Physics Faculty Of Engineering University Of Tokyo
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Hashizume Hiroo
Department Of Applied Physics Faculty Of Engineering University Of Tokyo
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