Magnetic properties of RF sputtered Fe-Ni films (第7回アジア情報記録技術シンポジウム〔英文〕)

概要

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45-55 NiFe films were deposited onto (100) Si substrate via radio frequency (RF) magnetron sputtering. The influence of composition, RF input power, argon pressure, substrate-to-target distance on the magnetic and structural properties of the films was investigated. X-ray diffraction measurements indicate that the films had the fcc structure and exhibited a dominant (111) orientation. The average grain sizes of films were 14-35nm. The maximum saturation magnetization (4 π Ms〜1.6×10^4 Gauss) could be obtained for films with the composition Fe_<54.5>Ni_<45.5>. Depending on deposition conditions, the films coercivity could be varied from 10 to 60 Oe. After annealing in 400℃ for an hour, the particles grew bigger with size 30-50nm, the films orientation did not change obviously, still showe (111) orientation, and the coercivity decreased.
社団法人映像情報メディア学会の論文
2002-11-08