Magnetic properties of RF sputtered Fe-Ni films
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概要
- 論文の詳細を見る
45-55 NiFe films were deposited onto (100) Si substrate via radio frequency (RF) magnetron sputtering. The influence of composition, RF input power, argon pressure, substrate-to-target distance on the magnetic and structural properties of the films was investigated. X-ray diffraction measurements indicate that the films had the fcc structure and exhibited a dominant (111) orientation. The average grain sizes of films were 14-35nm. The maximum saturation magnetization (4 π Ms〜1.6×10^4 Gauss) could be obtained for films with the composition Fe_54.5Ni_45.5. Depending on deposition conditions, the film coercivity could be varied from 10 to 60 Oe. After annealing in 400℃ for an hour, the particles grew bigger with size 30-50nm, the films orientation did not change obviously, still showed (111) orientation, and the coercivity decreased.
- 社団法人電子情報通信学会の論文
- 2002-11-01
著者
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Ma Y.
Research Institute Of Magnetic Materials Lanzhou University
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Ma Y.g.
Research Institute Of Magnetic Materials Lanzhou University
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Li X.
Research Institute of magnetic Materials Lanzhou university
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Wei X.
Research Institute of magnetic Materials Lanzhou university
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Yang Z.
Research Institute of magnetic Materials Lanzhou university
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Li X.H.
Research Institute of Magnetic Materials, Lanzhou University
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Wei F.l.
Research Institute Of Magnetic Materials Lanzhou University
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Li X
Research Institute Of Magnetic Materials Lanzhou University
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Wei X.H.
Research Institute of Magnetic Materials Lanzhou university
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