Homogeneous TiO_2-SiO_2 Ultralow-Expansion Glass for Extreme Ultraviolet Lithography Evaluated by the Line-Focus-Beam Ultrasonic Material Characterization System
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概要
- 論文の詳細を見る
- Japan Society of Applied Physicsの論文
- 2008-08-25
著者
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UEDA Tetsuji
Research Laboratory of Resources Utilization, Tokyo Institute of Technology
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Ueda Tetsuji
Research And Application Laboratory Shin-etsu Quartz Products Co. Ltd.
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KUSHIBIKI Jun-ichi
Department of Electrical Engineering, Tohoku University
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ARAKAWA Mototaka
Department of Electrical Engineering, Tohoku University
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FUJINOKI Akira
Research and Application Laboratory, Shin-Etsu Quartz Products Co., Ltd.
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Fujinoki Akira
Research And Application Laboratory Shin-etsu Quartz Products Co. Ltd.
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Kushibiki Jun-ichi
Deparment Of Electrical Engineering Faculty Of Engineering Tohoku University
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Arakawa Mototaka
Department Of Electrical Engineering Tohoku University
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