Development of Nd-doped Optical Gain Material Based on Silica Glass with High Thermal Shock Parameter for High-Average-Power Laser
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概要
- 論文の詳細を見る
In this paper, we report a demonstration of amplification at 1.06 μm in a bulk-type Nd-doped silica glass (Nd2O3: 1.25 wt%, Al2O3: 2.72 wt%, SiO2: 96.03 wt%) with a high thermal shock parameter for the first time. The optical gain of 1.75 was obtained in a 93-mm-long sample with a flash lamp pumping at 1.9 kJ, corresponding to a gain coefficient of 0.06 cm-1. The thermal shock parameter of Nd-doped silica glass was measured to be 12.0 W/cm, which is thirty times greater than that of phosphate glass and one and a half times greater that of Nd:YAG. We carried out a quick quenching experiment to determine the thermal shock toughness of Nd-doped silica glass, and the experiment demonstrated that the thermal shock toughness of Nd-doped silica glass was superior to that of the phosphate laser glass. We also calculated the thermal stress distribution in Nd-doped silica glass with a simple model for comparison with the experimental results; the model well explains the experimental results. These results indicate that Nd-doped silica glass can produce a compact, high-energy density, and high-average-power laser.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-04-15
著者
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Ueda Tetsuji
Research And Application Laboratory Shin-etsu Quartz Products Co. Ltd.
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Fujimoto Yasushi
Institute For Nuclear Study University Of Tokyo
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Fujinoki Akira
Research And Application Laboratory Shin-etsu Quartz Products Co. Ltd.
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Yoshida Hidetsugu
Institute Of Laser Engineering Osaka University
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Nakatsuka Masahiro
Institute for Laser Technology, 1-8-4 Utsubo-Honmachi, Nishi-ku, Osaka 550-0004, Japan
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