Effects of Optimization of Gate Edge Profile on sub-45nm Metal Gate High-k Dielectric Metal-Oxide-Semiconductor Field Effect Transistors Characteristics

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概要

• 論文の詳細を見る
• 2006-09-13

著者

• Lee B.

  Ibm Assignees

• SONG S.

  SEMATECH

• KANG C.

  SEMATECH

• BERSUKER G.

  SEMATECH

• CHOI R.

  SEMATECH

• YOUNG C.

  SEMATECH

• HEH D.

  SEMATECH

• BAE S.

  Microelectronics Research Center, Department of Electrical and Computer Engineering

• HUSSAIN M.

  SEMATECH

• LEE B.

  The University of Texas

• Bae S.

  Microelectronics Research Center Department Of Electrical And Computer Engineering

関連論文

• Achieving Band Edge Effective Work Function of Gate First Metal Gate by Oxygen Anneal Processes : Low Temperature Oxygen Anneal (LTOA) and High Pressure Oxygen Anneal (HPOA) Processes
• Interfacial Layer-Induced Mobility Degradation in High-k Transistors
• Demonstration of Low V_t NMOSFETs Using Thin HfLaO in ALD TiN/HfSiO Gate Stack
• Plasma Nitridation of HfO_2 Enabling a 0.9nm EOT with High Mobility for a Gate First MOSFET
• Highly Manufacturable Hf-silicate Technology with Optimized Composition for Gate-First Metal Gate CMOSFEI
• A novel inversion pulse measurement technique to investigate transient charging characteristics in high-k NMOS transistors
• Physical Origin of Fast Transient Charging in Hafnium Based Gate Dielectrics
• nMOSFET Reliability Improvement attributed to the Interfacial Dipole formed by La Incorporation in HfO_2
• Thermal stability of metal electrodes and its impact on gate dielectric characteristics
• Reliability of thick oxides integrated with HfSiO_x gate dielectric
• Effects of Optimization of Gate Edge Profile on sub-45nm Metal Gate High-k Dielectric Metal-Oxide-Semiconductor Field Effect Transistors Characteristics

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