高周波マグネトロンスパッタリング法によるPb(Zr, Ti)O_3圧電薄膜の量産技術

概要

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In this study, SME-200 (ULVAC and Inc.) was the mass production system of a PZT deposition got over the problems, and it was there, and deposition temperature of PZT thin films were investigated as a parameter by this research. (100)/(001) and (111) oriented Pb(Zr, Ti)O3 Piezoelectric thin films were fabricated on (111)Pt/Ti/SiO2/Si substrate using a RF magnetron sputtering technique. Polarization and displacement in these films were simultaneously observed through an atomic force microscope (AFM) that was attached to a ferroelectric test system. As a result, 3-μm-thick PZT film with Pr value of 41 μm/cm2 at an applied voltage of 30 V were obtained for (100)/(001) oriented film.
日本真空協会の論文
2006-03-20