Defect Reduction Treatment for Plasma-Tetraethylorthosilicate-SiO_2 by High-Pressure H_2O Vapor Heat Treatment

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2005-12-30

著者

• Strutz Thomas

  Unaxis Japan

• Kohno Atsushi

  Department of Radiology, Kobe University

• SAMESHIMA Toshiyuki

  Department of Electrical and Electric Engineering, Tokyo University of Agriculture and Technology

• WATAKABE Hajime

  Department of Engineering, Tokyo University of Agriculture and Technology

• Watakabe Hajime

  Department Of Electrical And Electronic Engineering Tokyo University Of Agriculture And Technology

• OITOME Teruki

  UNAXIS Japan

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