Pulsed-Laser-Induced Microcrystallization and Amorphization of Silicon Thin Films

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概要

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• Pulsed-laser-induced microcrystallization and amorphization of Si thin films were investigated by transient reflectance and conductance measurements. It was clarified experimentally that the complete melting of a Si film and subsequent supercooling induces both microcrystallization and amorphization. In the case of the microcrystallization of a 49.1-nm-thick Si film, nucleation among supercooled liquid Si was observed. The nucleation temperature and resulting nucleation rate under the microcrystallization condition were estimated to be 1047 K and $1.67\times 10^{25}$ events/($\text{cm}^{3}{\cdot}\text{s}$), respectively. On the other hand, no significant nucleation was observed in the case of a laser amorphization of 20.7-nm-thick Si film although the film was melted for the relatively long duration of about 80 ns. Extremely fast quench of liquid Si films seems to suppress nucleation and results in solidification in amorphous phase.

• Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
• 2001-02-15

著者

• HIGASHI Seiichiro

  Base Technology Research Center, Seiko Epson Corp.

• SAMESHIMA Toshiyuki

  Department of Electrical and Electric Engineering, Tokyo University of Agriculture and Technology

• Sameshima Toshiyuki

  Department of Engineering, Tokyo University of Agriculture and Technology, 2-24-16 Naka-cho, Koganei, Tokyo 184-8588, Japan

• Higashi Seiichiro

  Base Technology Research Center, Seiko Epson Corp., 3-3-5 Owa, Suwa, Nagano 392-8502, Japan

関連論文

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• Application of Plasma Jet Crystallization Technique to Fabrication of Thin-Film Transistor
• Pulsed-Laser-Induced Microcrystallization and Amorphization of Silicon Thin Films
• Defect Reduction Treatment for Plasma-Tetraethylorthosilicate-SiO_2 by High-Pressure H_2O Vapor Heat Treatment
• Stress in Pulsed-Laser-Crystallized Silicon Films
• Experimental Study of the Hyper-Raman Scattering Due to Raman Inactive Lattice Vibration in SrTiO_3
• Observation of the Phonon Polariton in the Centrosymmetric Crystal of SrTiO_3 by Hyper-Raman Scattering
• Observation of Hyper-Raman Scattering Spectra Due to Lattice Vibration in SrTio_3
• Stress in Pulsed-Laser-Crystallized Silicon Films
• Pulsed-Laser-Induced Microcrystallization and Amorphization of Silicon Thin Films
• Defect Reduction Treatment for Plasma–Tetraethylorthosilicate–SiO2 by High-Pressure H2O Vapor Heat Treatment
• Experimental Study on Surface-Orientation/Strain Dependence of Phonon Confinement Effects and Band Structure Modulation in Two-Dimensional Si Layers
• Application of Plasma Jet Crystallization Technique to Fabrication of Thin-Film Transistor

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