ウェットプロセスによる機能ナノ構造薄膜形成(<特集>「磁性薄膜作製技術II」)

概要

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Wet fabrication processes for functional nanostructures, such as electrolytic and electroless deposition, are reviewed. Compared with dry processes such as sputtering and vacuum evaporation, the deposition mechanisms of these processes are complicated and not easy to control, while deep understanding of the mechanisms will enable precise control of the process at an atomistic level. Some examples of fabrication processes for functional nanostructures are overviewed, such as defect free "super-filling" of high-aspect-ratio trenches less than 100nm in width using the Cu electrodeposition process, deposition of multi-layered thin films using the pulse deposition process, and formation of arrayed pores and nanowires using electrochemical etching and deposition. The features and possible applications of the electroless deposition processes are also explained, and a maskless and electroless fabrication process of metallic nanodot array on a Si wafer surface is also described.
社団法人日本磁気学会の論文
2005-12-01