Structural Evaluation of CVD WSix and Its Effect on Polycide Line Resistance
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概要
- 論文の詳細を見る
- 1995-11-30
著者
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Park J
Memory R&d Center Hyundai Electronics Industries Co. Ltd.
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Park Jin
Advanced Process Team Memory R&d Division Hyundai Electronics Industries Co. Ltd.
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Park J
Yonsei Univ. Seoul Kor
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Park Jin
R&d Division Lg Semicon. Co. Ltd.
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Byun J
Process Team R&d Division Lg Semicon.co.ltd.
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Lee Byung
Process Development Department 3 Memory R&d Division Hyundai Electronics Co. Ltd.
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Park Jaehyuk
Department Of Electrical & Electronic Engineering. Toyohashi University Of Technology
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Park J
Hyundai Microelectronics Co. Ltd. Chungju Kor
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Byun Jeong
Ulsi Laboratory Of Lg Semicon Co. Ltd.
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PARK Jin
ULSI Laboratory of LG Semicon Co., Ltd.
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KIM Jae
ULSI Laboratory of LG Semicon Co., Ltd.
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LEE Byung
ULSI Laboratory of LG Semicon Co. Ltd.
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KIM Eui
ULSI Laboratory of LG Semicon Co. Ltd.
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HWANG Hyunsang
ULSI Laboratory of LG Semicon Co. Ltd.
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Kim Jac
Microprocessing Research Lab. School Of Chemical Engineering College Of Engineering Seoul National U
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Hwang Hyunsang
Ulsi Laboratory Lg Semicon Co.
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